The relevant parameters are the following:
are the inner and outer ratio of the racetrack.
is the distance between substrate and the target.
are related to the shape of the cloud of evaporated material for the angular distribution
for each material.
is the percentage of the second material added to the primary target.
are the sputter yield of the two materials.
The interaction of the evaporated atoms with the gas-phase plasma is not considered but is under study for future versions of this program.
The graph at the top-left is a view of the deposited film over the substrate. The red concentric circles show the width of the racetrack and the yellow bars delimit the thickness of the second material added to the primary target. You can move the cross section point to see different cross sections of the deposited film.
The graph at the top-right is a cross section along the
axis, showing a slice of the distribution of each material.
The graph at the bottom-left shows a cross section of the
axis, showing the distribution of each material.
The graph at the bottom-right corner is a 3D version of the deposited film over the substrate created with CO-SS.
The checkbox after clicking "deposition plots" indicates which graphs are displayed. Available plots are: material, sum of concentrations, and normalization (relative concentrations).
This program is part of the MSc thesis of J. Cruz, "Síntesis y Simulación de la Preparación de Peliculas Basadas en Aluminio y Titanio Depositadas por Sputtering con Magnetrón" (IIM - IF, UNAM), in progress.