Scanning Electrochemical Microscopy: Negative Feedback Approach Curve

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This Demonstration shows how the negative feedback (insulating substrate) approach curve in scanning electrochemical microscopy (SECM) varies with the radius of the glass sheath of the ultramicroelectrode (UME).

Contributed by: Abhiroop Mishra (June 2020)
Open content licensed under CC BY-NC-SA



In SECM, approach curves are used to position the UME near the substrate. The approach curve varies with the radius of the glass sheath of the UME.

: ratio of the radius of the glass sheath to the radius of the wire in the UME.

: current at the UME.

: steady-state current at the UME.

: distance from the substrate/radius of the UME.

The equation used in this Demonstration is from [1].


[1] C. Lefrou and R. Cornut, "Analytical Expressions for Quantitative Scanning Electrochemical Microscopy (SECM)," ChemPhysChem, 11(3), 2010 pp. 547–556. doi:10.1002/cphc.200900600.

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